Emerging Lithographic Technologies
Michael James Lercel
Minoru Sugawara, Iwao Nishiyama, and Mikio Takai: "Effect of mask pattern correction for off-axis incident light in extreme ultraviolet lithography", J. Vac. Sci. Technol. B22(6) (2004) pp. 3053-3058. 4. Minoru Sugawara, Iwao Nishiyama, and ...